Targets & Evaporations materials

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site rencontre avec libanais Sputtering/PVD targets

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source Basic requirements for PVD/ sputtering to take place:

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  • Power (Cathode/anode) -> plasma
  • Gas (Ar), sometime air when contamination is not critical
  • Deposition materials (Target)
  • Vacuumn chamber (vacuum pump) -> also to prevent oxidation

https://distillery244.com/frnew1/4391 High consumption are coming from foundries in CVD module (Endura tool), the materials or targets used are usually metals such as Al, Cu, Ti, W, TiN, Co..etc

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see url Smaller (1~3″) and thinner disc foil targets are required from laboratories with sputtering coater. These coater deposits a very thin film over samples to be viewed in imaging tool such as SEM. The usual material that of these targets are conductive materials such as Au, Ag, C and Pt.

https://www.gostatewide.net/marderos/2371

http://qhublogistics.net/?ploskis=site-de-rencontre-pulpeclub.com&3a9=28 Targets used in R&D are least common but high demanding, they could be composition of metals and non metals. Composite targets require very experienced maker to produce finished product of high quality.

http://diebrueder.ch/piskodral/4919